INFLUENCE OF GERMANIUM AND BORON DOPING ON STRUCTURAL AND PHYSICAL-MECHANICAL CHARACTERISTICS OF MONOCRYSTALLINE SILICON
Ia R. Kurashvili, George Sh. Darsavelidze, Guram V. Bokuchava, Iasha M. Tabatadze, George G. Chubinidze
Strony: 298-302
Opublikowano: 2 Jun 2014
Wyświetlenia: 3,379
Pobrania: 706
Streszczenie: Contains special characters which cannot be displayed.
Słowa kluczowe: silicon, germanium, boron, activation energy, internal friction, shear modulus
Cytowanie artykułu: Ia R. Kurashvili, George Sh. Darsavelidze, Guram V. Bokuchava, Iasha M. Tabatadze, George G. Chubinidze. INFLUENCE OF GERMANIUM AND BORON DOPING ON STRUCTURAL AND PHYSICAL-MECHANICAL CHARACTERISTICS OF MONOCRYSTALLINE SILICON. Journal of International Scientific Publications: Materials, Methods & Technologies 8, 298-302 (2014). https://www.scientific-publications.net/en/article/1000176/
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