International Scientific Publications
© 2023 Science Events Ltd
Terms of Use  ·  Privacy Policy
Choose language English French Bulgarian
Conference room
Materials, Methods & Technologies 2024, 26th International Conference
15-18 August, Burgas, Bulgaria
Call for Papers

Materials, Methods & Technologies, Volume 12, 2018

H AND D RETENTION IN WNOX FILMS
N. Matsunami, N. Ohno, M. Tokitani, B. Tsuchiya, M. Sataka
Pages: 335-342
Published: 6 Sep 2018
Views: 1,116
Downloads: 165
Abstract: W is the main wall material in the international fusion device and seeding of N containing gas is under consideration for plasma edge cooling and H isotope removal from the wall. In this environment with residual oxygen gas, it is highly anticipated that WNOx layers are formed on W. Thus, knowledge of H-isotope retention in WNOx layers is important for understanding of H-isotope recycling. Using WNOx (x=0.4±0.2) films prepared on C-plane-cut-sapphire (C-Al2O3) substrate, we have investigated H and D retention, and depth profile of H and D, using D(3He, α)H nuclear reaction analysis (NRA), H(15)O-NRA and elastic recoil detection (ERD). In as-deposited films, we find a high density (0.4x1022 cm-3) of H by 15N -NRA. After low energy D-plasma exposure (~1018 cm-2), we also find a large amount of D-retention (~ 1017 cm-2) by 3He -NRA, as well as high density D by ERD, and that high density of H remains in the film. These results cannot be understood by a simple H-D replacement.
Keywords: wnox, h and d retention, ion beam analysis
Cite this article: N. Matsunami, N. Ohno, M. Tokitani, B. Tsuchiya, M. Sataka. H AND D RETENTION IN WNOX FILMS. Journal of International Scientific Publications: Materials, Methods & Technologies 12, 335-342 (2018). https://www.scientific-publications.net/en/article/1001711/
Download full text

Back to the contents of the volume
By using this site you agree to our Privacy Policy and Terms of Use. We use cookies, including for analytics, personalisation, and ads.